专利名称：Staging apparatus and method, and method
for manufacturing the staging apparatus,and exposing apparatus using the stagingapparatus
发明人：Atsushi Yamaguchi,Shigeru Yamasaki申请号：US09/122754申请日：19980727公开号：US05983513A公开日：19991116
摘要：A positioning staging apparatus comprises a base provided on a floor, a stageprovided on the base and movable to the base, an output unit for outputting stagepositioning information for moving the stage to a predetermined target position, a stagedrive unit provided on the base for driving the stage and outputting the drive
information, a stage control unit for controlling the stage drive unit to accelerate anddecelerate the stage in accordance with the stage positioning information to stop thestage at the target position, a stage displacement detection unit for detecting thedisplacement of the stage driven by the stage drive unit to output the stage
displacement information, and an anti- vibration unit provided between the floor and thebase for applying to the base a force to suppress the vibration of the base generated bythe movement of the stage. The anti-vibration unit generates the suppression force inaccordance with one of the stage displacement information and the stage positioninginformation. A method for manufacturing a staging apparatus and a method forcontrolling movement of a stage are also provided.
申请人：NIKON CORPORATION
代理机构：Vorys, Sater, Seymour and Pease LLP
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