专利名称:SHORT CHANNEL TRENCH POWER MOSFET发明人:KNOLL, Lars,MINAMISAWA, Renato申请号:EP17733450.5申请日:20170627公开号:EP3479410A1公开日:20190508
摘要:The power semiconductor device according to the invention is a trench powerfield effect transistor, at all locations within a channel region a first local doping
concentration is less than 1·10 cm. In the base layer a second local doping concentrationis at least 1·10 cm at all locations within the base layer. In the invention a channel lengthL, fulfils the following inequation: (I), wherein ε is a permittivity of the channel region, εis apermittivity of the gate insulation layer, is a thickness of the channel region in a directionperpendicular to an interface between the gate insulation layer and the channel region,and is a thickness of the gate insulation layer in a direction perpendicular to the interfacebetween the gate insulation layer and the channel region.
申请人:ABB Schweiz AG
地址:Brown Boveri Strasse 6 00 Baden CH
国籍:CH
代理机构:Kuhnen & Wacker Patent- und Rechtsanwaltsbüro PartG mbB
更多信息请下载全文后查看
因篇幅问题不能全部显示,请点此查看更多更全内容
Copyright © 2019- igbc.cn 版权所有 湘ICP备2023023988号-5
违法及侵权请联系:TEL:199 1889 7713 E-MAIL:2724546146@qq.com
本站由北京市万商天勤律师事务所王兴未律师提供法律服务